XJP-405 industrial microscope is equipped with a large moving range mechanical stage, Epi-illuminator, long working distance bright and dark field Infinite Plan objectives, wide field eyepiece with clear images and good contrast. It is developed and aimed at the semiconductor industry, wafer manufacturing, electronic in formation industry, metallurgical industry, and used as high grade industrial microscope. Bright ＆ Dark field observation, EPI-polarizing and DIC observation can proceed. It is widely used in Factories, Research institution and college and Universities to identify and analyze Wafer, FPD, Circuit substrate, Precision moulds.

CHARACTERISTIC & DESCRIPTION

Adopt UIS high-resolution, long working distance, and infinity light path correcting system objective imaging technology

Extending the multiplexing technology of objective, compatible infinityobjective with all the observation methods. including bright ＆ dark field observation, polarization and also provide with high clear and sharp image in each observation method.

Aspherical surface Kohler illumination, increasing the viewing brightness.

WF10 X（Φ25）super wide field eyepiece, long working distance metallurgical objective with bright and dark field

The nosepiece can be equipped with detachable DIC differential interference device.