XJP-607 Industrial Metallurgical microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced Metallurgical microscope, the user can experience its super performance when using it.It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

Characteristicsand description

1. UIS infinite-optical system.

2. Adopt long-life halogen light source with much higher light efficiency.

3. Bright and dark field, Polarization and differential interference function.

4. The aspherical Kohler illumination, increasing the brightness of observation.

5. WF10X/Φ25 super wide viewing field eyepiece, long working distance metallurgical objective with bright and dark field

6. The Quintuple Nosepiece can be equipped with detachable DIC differential interference device.

DIC: Nomarski differential interference contrast observation is deemed to the essential means to checkout the materials, semiconductor and metal structure now.